// X-Ray Fluorescence Analysis (XRF-Analysis)

X-ray fluorescence analysis (XRF) is a standard method for the fast and non-destructive determination of film thicknesses and elemental compositions of solids and liquids. XRF can be measured at individual points or the homogeneity mapped over an area of up to 30 x 30 cm2. The information depth for XRF is several micrometers.

XRF, surface analysis methods, and scanning electron microscopy with EDX, are also available for external customers. Questions regarding the chemical composition and structure of surfaces, thin films, and compact materials often require the combined application of all of these techniques. By virtue of our many years of experience in the analysis of semiconductors, metal alloys, plastics, ceramics, coated glasses, compound materials, and other materials, we can quickly adjust to your special analytical requirements.

Areas of Application

  • Elemental composition of solids and liquids
  • Identification of contaminants
  • Measurement of film thickness
  • Composition of single layers
  • Characterisation of layer systems (e. g. thin-film solar cells)
  • Elemental distribution analysis with a lateral resolution of up to 100 ┬Ám


  • Energy dispersive X-ray fluorescence spectrometer EAGLE XXL


  • CIGS solar module: overview
  • CIGS-Solarmodul (30 cm x 30 cm)
  • CIGS solar module (30 cm x 30 cm):Spatially resolved [Ga]/[Ga+In]-ratios and layer thicknesses
  • Detection of brass 



Dr. Theresa Friedlmeier
+49 (0)711 78 70-293
XRF system Eagle XXL at the ZSW